Introduction to EUV Lithography Component Inspection Platform with a Standalone Light Source

Wen-Hao Cho^1*

¹National Center for Instrumentation Research, National Institutes of Applied Research, Hsinchu, Taiwan

* Presenter:Wen-Hao Cho, email:0609499@niar.org.tw

Extreme Ultraviolet (EUV) lithography is the cornerstone technology driving the semiconductor industry toward sub-3 nm logic nodes and beyond. The ultra-short 13.5 nm wavelength of EUV light imposes stringent requirements on the performance, cleanliness, and stability of all optical components, photomasks, and photoresist materials. To effectively support the development and qualification of the EUV components, a dedicated, highly versatile, and cost-efficient inspection platform is critically needed. Therefore, NCIR established a Lithography Component Inspection Platform featuring a standalone EUV light source, designed to serve as an integrated research and development environment for industry, academia, and research institutions.

The inspection platform utilizes Energetiq Z-pinch EUV light source, and its irradiation intensity is enhanced through an optical collimation system. This platform consists of the following key modules: reflectivity measurement, photoresist outgassing analysis, blank mask inspection and hydrogen etch resistance testing modules. The platform could provide an essential, multi-functional validation tool for material and process development.

Keywords: Extreme Ultraviolet lithography, Inspection, Reflectivity