Study of the hybrid-X-pinch radiation source

Che-Yu Liu^1*, Li-Yang Hsieh¹, Shu-wei Kao², Kuan-Chun Lee³, Cheng-Ju Tsai³, Po-Yu Chang¹

¹Institute of Space and Plasma Sciences, National Cheng Kung University, Tainan, Taiwan
²Department of Photonics, National Cheng Kung University, Tainan, Taiwan
³Department of Physics, National Cheng Kung University, Tainan, Taiwan

* Presenter:Che-Yu Liu, email:xx4185@gmail.com

To generate 13.5-nm extreme ultraviolet (EUV) light, which is crucial for future semiconductor lithographic technology, the dynamic process of the hybrid-X-pinch radiation source is being studied. The hybrid-X-pinch set up consists of two electrons and a wire in between. The wire is compressed rapidly by the z-pinch effect and can be used as a point source. Since the compression happens so fast, the plasma is compressed adiabatically. Therefore, it can be heated and radiate EUV light. Two conical nozzle electrodes with hole diameters of 0.5 mm and 0.2 mm were used. The experiment was driven by a 1-kJ pulsed-power system charged to 20 kV. The peak current and the rise time of the pulsed current were approximately 100 kA and 1.6 µs, respectively. The tin wire with diameters around 1 mm can be heated by adiabatic compression to over 30 eV to produce 13.5 nm EUV light. Time-resolved shadowgraph, schlieren, polarimetry, and interferometric images captured using a 532-nm frequency doubled Nd-Yag Q-switched laser with a pulse width of about 5 ns. Furthermore, a UV camera was used to observe the location and shape of the radiation. As a result, the dynamic process of the hybrid-X pinch is studied and shown.

Keywords: hybrid-X-pinch, EUV , pulsed-power system